Show hand : 430393

Handnr: 430393
Submitted by : Aphelion

Motivation
-advantages of NSL
-limitations of current optical lithography
-bottom up, massively parrallel
-applications deposit small nanoparticles for CNTs, nanowires, photonic crystals
-describe limitations, current technology is limited to >50nm diameter spheres
-our goal is to allow NSL at much smaller sphere diameters w/ few defects at higher domain sizes

Introduction / Background

-mention beginnings of NSL by Van Duyne's group
-briefly discuss the work they did
-techniques w/ angle resolved lithography
-combine w/ RIE

-monolayer / double layer
-include images of current results
-discuss mechanism behind NSL


-current ideas /directions
-> ? masks -> smaller mask?
->continous etch / multiple coatings etch + remove outer coating of nanospheres, repack / angle resolve lithography

->magnetization / functionalization of nanospheres

-learn more about convective forces
-size effects
-role of surface energies


Budget

Comments

All hands submitted by Aphelion: